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For the Inventor, By the Inventor

Fujisawa, Japan

Atsushi Shigeta

This inventor holds 43 USPTO granted patents, primarily in Chemical Mechanical Polishing. Top assignees: Kabushiki Kaisha Toshiba, Ebara Corporation, Jsr Corporation. Active years: 1995-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Shigeta. Retrieved from https://idiyas.com/inventor/atsushi-shigeta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 43

% Patents Active = 72.1

Average Co-Inventor Count = 4.4

ph-index = 13

Forward Citations = 499(Granted Patents)


Location History:

  • Kawasaki, JP (1995 - 1997)
  • Yamato, JP (1995 - 1999)
  • Yokkaichi, JP (2011 - 2012)
  • Mie, JP (2012)
  • Kanagawa-ken, JP (1997 - 2013)
  • Kanagawa, JP (2010 - 2013)
  • Fujisawa, JP (1997 - 2014)
  • Tokyo, JP (2014 - 2019)

Company Filing History:

goldMedal40 out of 53,250 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal17 out of 2,573 
 
Ebara Corporation
 patents
bronzeMedal2 out of 1,078 
 
Jsr Corporation
 patents
4. 1 out of 2,955 
 
Toshiba Memory Corporation
 patents
5. 1 out of 834,453 
Other
 patents
where one patent can have more than one assignee

Years Active: 1995-2019

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Areas of Expertise:
Chemical Mechanical Polishing
Semiconductor Device
Endpoint Detection
Substrate Processing
Polishing Apparatus
Aqueous Dispersion
Wafer Cleaning
Optical Measurement
Planarizing Layer
Residual Film
Fabrication Method
Manufacturing Process
43 patents (USPTO):Explore Patents
1. 10207390 - Processing end point detection method, polishing method, and polishing apparatus (2019-02-19),
2. 8777694 - Polishing endpoint detection method (2014-07-15),
3. 8696924 - Polishing apparatus and polishing method (2014-04-15),
4. 8685857 - Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device (2014-04-01),
5. 8568199 - Polishing endpoint detection apparatus (2013-10-29),
6. 8554356 - Processing end point detection method, polishing method, and polishing apparatus (2013-10-08),
7. 8506362 - Polishing apparatus and polishing method (2013-08-13),
8. 8388409 - Substrate polishing apparatus (2013-03-05),
9. 8152598 - Substrate treating method and substrate treating apparatus (2012-04-10),
10. 8119517 - Chemical mechanical polishing method and method of manufacturing semiconductor device (2012-02-21),
11. 8114776 - Method of manufacturing semiconductor device (2012-02-14),
12. 8084364 - Method of fabricating semiconductor device (2011-12-27),
13. 7767472 - Substrate processing method and substrate processing apparatus (2010-08-03),
14. 7744445 - Polishing apparatus and polishing method (2010-06-29),
15. 7700489 - Method of manufacturing a semiconductor device (2010-04-20),

Title: Atsushi Shigeta: Pioneering Inventor from Fujisawa

Introduction: Atsushi Shigeta is a renowned inventor hailing from Fujisawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Atsushi Shigeta holds several patents in the areas of robotics, artificial intelligence, and renewable energy, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Atsushi Shigeta has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Atsushi Shigeta has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge-sharing.

Conclusion: Atsushi Shigeta's passion for innovation, coupled with his dedication to pushing the boundaries of technology, has solidified his reputation as a trailblazing inventor in Fujisawa and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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