The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2010

Filed:

Oct. 12, 2005
Applicants:

Takeo Kubota, Kanagawa, JP;

Atsushi Shigeta, Kanagawa, JP;

Gen Toyota, Oita, JP;

Tamami Takahashi, Tokyo, JP;

Daisaku Fukuoka, Tokyo, JP;

Kenya Ito, Tokyo, JP;

Inventors:

Takeo Kubota, Kanagawa, JP;

Atsushi Shigeta, Kanagawa, JP;

Gen Toyota, Oita, JP;

Tamami Takahashi, Tokyo, JP;

Daisaku Fukuoka, Tokyo, JP;

Kenya Ito, Tokyo, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing apparatus has a polishing tape (), a supply reel () for supplying the polishing tape () to a contact portion () at which the polishing tape () is brought into contact with a notch portion () of a substrate (), and a take-up reel () for winding up the polishing tape () from the contact portion (). The polishing apparatus also has a first guide portion () having as guide surface () for supplying the polishing tape () directly to the contact portion (), and a second guide portion () having a guide surface for supplying the polishing tape () tot the take-up reel (). The guide surface () of the first guide portion () and/or the guide surface of the second guide portion () has a shape corresponding to a shape of the notch portion () of the substrate ().


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