Location History:
- Uita, JP (2006)
- Oita, JP (2010)
- Yokohama, JP (2007 - 2012)
Company Filing History:
8 out of 52,735 
5 out of 2,510 
Years Active: 2006-2012
Title: Gen Toyota: Innovator in Substrate Polishing Technology
Introduction
Gen Toyota is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of substrate polishing technology, holding a total of 8 patents. His innovative designs focus on enhancing the efficiency and effectiveness of substrate polishing processes.
Latest Patents
Among his latest patents are the substrate holding mechanism, substrate polishing apparatus, and substrate polishing method. These inventions are designed to minimize the amount of heat generated during the polishing of substrates. They also effectively cool the substrate holding part of the mechanism while preventing polishing solutions and dust from adhering to the outer peripheral portion of the substrate holding part. The substrate holding mechanism features a mounting flange, a support member, and a retainer ring. The substrate is held on the lower side of the support member, surrounded by the retainer ring, and is pressed against the polishing surface of a polishing table. A flow passage is provided in the mounting flange, allowing a temperature-controlled gas to cool the components and spray onto the polishing surface.
Career Highlights
Gen Toyota has worked with notable companies such as Kabushiki Kaisha Toshiba and Ebara Corporation. His experience in these organizations has contributed to his expertise in substrate polishing technology and innovation.
Collaborations
Some of his coworkers include Hiroyuki Yano and Atsushi Shigeta, who have collaborated with him on various projects.
Conclusion
Gen Toyota's contributions to substrate polishing technology demonstrate his commitment to innovation and efficiency in the field. His patents reflect a deep understanding of the challenges in substrate polishing and provide effective solutions to enhance the process.