The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2013

Filed:

Jul. 08, 2008
Applicants:

Dai Fukushima, Kanagawa, JP;

Atsushi Shigeta, Kanagawa, JP;

Tamami Takahashi, Tokyo, JP;

Kenya Ito, Tokyo, JP;

Masaya Seki, Tokyo, JP;

Hiroaki Kusa, Tokyo, JP;

Inventors:

Dai Fukushima, Kanagawa, JP;

Atsushi Shigeta, Kanagawa, JP;

Tamami Takahashi, Tokyo, JP;

Kenya Ito, Tokyo, JP;

Masaya Seki, Tokyo, JP;

Hiroaki Kusa, Tokyo, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing apparatus includes a substrate holder configured to hold and rotate a substrate, a press pad configured to press a polishing tape having a polishing surface against a bevel portion of the substrate held by the substrate holder, and a feeding mechanism configured to cause the polishing tape to travel in its longitudinal direction. The press pad includes a hard member having a pressing surface for pressing the bevel portion of the substrate through the polishing tape, and at least one elastic member for pressing the hard member against the bevel portion of the substrate through the belt-shaped polishing tool.


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