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For the Inventor, By the Inventor

Kamakura, Japan

Dai Fukushima

This inventor holds 30 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Semiconductor Manufacturing. Top assignees: Kabushiki Kaisha Toshiba, Toshiba Memory Corporation, Ebara Corporation. Active years: 2001-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dai Fukushima. Retrieved from https://idiyas.com/inventor/dai-fukushima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30 

% Patents Active = 63.3


Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 126(Granted Patents)


Location History:

  • Fujisawa, JP (2001 - 2005)
  • Kamakura, JP (2005 - 2012)
  • Sagamihara, JP (2005 - 2012)
  • Kanagawa, JP (2009 - 2014)
  • Kuwana, JP (2016 - 2021)

Company Filing History:

goldMedal25 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal5 out of 2,955 
 
Toshiba Memory Corporation
 patents
bronzeMedal1 out of 2,576 
 
Ebara Corporation
 patents
4. 1 out of 1,078 
 
Jsr Corporation
 patents
where one patent can have more than one assignee

Years Active: 2001-2021

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Areas of Expertise:
Polishing Device
Cleaning Apparatus
CMP Slurry
Semiconductor Fabrication
Polishing Method
Substrate Treatment
Chemical Mechanical Polishing
Manufacturing Method
Polishing Apparatus
Retainer Ring
Aqueous Dispersion
Dummy Wire
30 patents (USPTO):Explore Patents
1. 11097397 - Polishing device, polishing method, and record medium (2021-08-24),
2. 10441979 - Cleaning apparatus and cleaning method (2019-10-15),
3. 9902038 - Polishing apparatus, polishing method, and semiconductor manufacturing method (2018-02-27),
4. 9849558 - Polishing pad dresser, polishing apparatus and polishing pad dressing method (2017-12-26),
5. 9748090 - Semiconductor manufacturing apparatus and manufacturing method of semiconductor device (2017-08-29),
6. 9539696 - Retainer ring, polish apparatus, and polish method (2017-01-10),
7. 9502318 - Polish apparatus, polish method, and method of manufacturing semiconductor device (2016-11-22),
8. 9296083 - Polishing apparatus and polishing method (2016-03-29),
9. 8778802 - Polishing method and method for fabricating semiconductor device (2014-07-15),
10. 8506362 - Polishing apparatus and polishing method (2013-08-13),
11. 8337715 - CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device (2012-12-25),
12. 8174125 - Manufacturing method of a semiconductor device (2012-05-08),
13. 8152598 - Substrate treating method and substrate treating apparatus (2012-04-10),
14. 7842191 - CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device (2010-11-30),
15. 7833431 - Aqueous dispersion for CMP, polishing method and method for manufacturing semiconductor device (2010-11-16),

Title: The Innovative Contributions of Dai Fukushima

Introduction

Dai Fukushima, a prolific inventor based in Kamakura, Japan, has made significant contributions to the field of polishing and cleaning technologies. With an impressive portfolio of 30 patents, his work reflects a commitment to advancing industrial processes.

Latest Patents

Among his latest innovations are a polishing device, a polishing method, and a record medium. This polishing device features a sensor that detects characteristics of the polishing surface, an end point detector that identifies when certain conditions have been met, and an end point condition setter that adjusts the conditions based on device and target information. Additionally, he has developed a cleaning apparatus that consists of a substrate cleaner and a member cleaner, designed to enhance cleaning efficiency through structured regions that correspond to specific cleaning tasks.

Career Highlights

Throughout his career, Dai has worked with notable companies such as Kabushiki Kaisha Toshiba and Toshiba Memory Corporation. His experience in these prestigious organizations has allowed him to hone his skills and contribute to groundbreaking technologies.

Collaborations

Dai Fukushima has worked alongside talented colleagues, including Gaku Minamihaba and Hiroyuki Yano. These collaborations have fostered an environment of innovation, leading to the development of cutting-edge patents that demonstrate their collective expertise.

Conclusion

Dai Fukushima's work exemplifies the spirit of innovation. His latest patents underscore his role as a key contributor to advanced technologies in polishing and cleaning systems. With a robust patent portfolio, he continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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