The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Nov. 17, 2006
Gaku Minamihaba, Yokohama, JP;
Nobuyuki Kurashima, Yokohama, JP;
Dai Fukushima, Kamakura, JP;
Yukiteru Matsui, Yokohama, JP;
Susumu Yamamoto, Oita, JP;
Hiroyuki Yano, Yokohama, JP;
Gaku Minamihaba, Yokohama, JP;
Nobuyuki Kurashima, Yokohama, JP;
Dai Fukushima, Kamakura, JP;
Yukiteru Matsui, Yokohama, JP;
Susumu Yamamoto, Oita, JP;
Hiroyuki Yano, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
An aqueous dispersion for chemical mechanical polishing is provided, which includes water and a resin particle. The resin particles accompany with a projection having a curvature radius ranging from 10 nm to 1.65 μm on a surface. The maximum length of the resin particles is not more than 5 μm and is 2.5 to 25 times as large as the curvature radius.