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For the Inventor, By the Inventor

Yokohama, Japan

Gaku Minamihaba

This inventor holds 63 USPTO granted patents and 16 published patent applications and 2 EPO patents, primarily in Semiconductor Manufacturing (CPC class H01L). Top assignees: Kabushiki Kaisha Toshiba, Jsr Corporation, Toshiba Memory Corporation. Active years: 1997-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gaku Minamihaba. Retrieved from https://idiyas.com/inventor/gaku-minamihaba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 63 

% Patents Active = 61.9


Average Co-Inventor Count = 3.6

ph-index = 11

Forward Citations = 512(Granted Patents)

Forward Citations (Not Self Cited) = 472(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Kawasaki, JP (1997 - 2012)
  • Yokohoma, JP (2013)
  • Yokohama, JP (2002 - 2014)
  • Kanagawa, JP (2003 - 2014)
  • Kanagawa-ken, JP (2014 - 2019)

Company Filing History:

goldMedal58 out of 53,250 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal2 out of 1,078 
 
Jsr Corporation
 patents
bronzeMedal1 out of 2,955 
 
Toshiba Memory Corporation
 patents
4. 4 out of 834,453 
Other
 patents
where one patent can have more than one assignee

Years Active: 1997-2019

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Areas of Expertise:
Semiconductor Device
Polishing Method
Planarization
CMP Slurry
Chemical Mechanical Polishing
Device Fabrication
Manufacturing Method
Aqueous Dispersion
Post-CMP Treatment
Organic Film
Cu Film
Dummy Wire
63 patents (USPTO):Explore Patents
1. 10283383 - Planarization method and planarization apparatus (2019-05-07),
2. 9144879 - Planarization method and planarization apparatus (2015-09-29),
3. 9012246 - Manufacturing method of semiconductor device and polishing apparatus (2015-04-21),
4. 8871644 - Method of manufacturing semiconductor device (2014-10-28),
5. 8778802 - Polishing method and method for fabricating semiconductor device (2014-07-15),
6. 8754433 - Semiconductor device and method of manufacturing the same (2014-06-17),
7. 8703004 - Method for chemical planarization and chemical planarization apparatus (2014-04-22),
8. 8685857 - Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device (2014-04-01),
9. 8575030 - Semiconductor device manufacturing method (2013-11-05),
10. 8480915 - Method of manufacturing semiconductor device (2013-07-09),
11. 8337715 - CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device (2012-12-25),
12. 8174125 - Manufacturing method of a semiconductor device (2012-05-08),
13. 7951717 - Post-CMP treating liquid and manufacturing method of semiconductor device using the same (2011-05-31),
14. 7842191 - CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device (2010-11-30),
15. 7833431 - Aqueous dispersion for CMP, polishing method and method for manufacturing semiconductor device (2010-11-16),

Title: The Innovative Journey of Gaku Minamihaba

Introduction: Gaku Minamihaba is a visionary inventor hailing from Yokohama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Gaku Minamihaba holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to problem-solving.

Career Highlights: With a career spanning over two decades, Gaku Minamihaba has worked with leading tech companies and research institutions, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Gaku Minamihaba has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and creativity that has led to numerous successful projects and inventions.

Conclusion: Gaku Minamihaba's passion for innovation, coupled with his relentless drive to push the boundaries of what is possible, has solidified his reputation as a trailblazer in the world of technology and invention. His work continues to inspire future generations of inventors and innovators to think big and aim for the stars.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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