This inventor holds 20 USPTO granted patents and 2 EPO patents, primarily in Semiconductor Manufacturing. Top assignees: Kabushiki Kaisha Toshiba, Jsr Corporation. Active years: 2004-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kanagawa, JP (2005 - 2009)
- Yokohama, JP (2004 - 2012)
- Yokohama, PA (2012)
- Yokohoma, JP (2005 - 2013)
Company Filing History:
20 out of 53,286 
2 out of 1,078 
Years Active: 2004-2013
Areas of Expertise:
Title: Inventor Profile: Nobuyuki Kurashima
Introduction
Nobuyuki Kurashima is a distinguished inventor based in Yokohama, Japan, known for his innovative contributions in the field of semiconductor technology. With a remarkable portfolio of 20 patents, Kurashima's work continues to drive advancements in semiconductor device manufacturing.
Latest Patents
Kurashima has been instrumental in developing cutting-edge methodologies including a semiconductor device manufacturing method that emphasizes precision through temperature control during the polishing process. His latest patents detail a unique approach where the entrance temperature of the polishing pad is meticulously managed to enhance the quality of the semiconductor substrate. This method includes first polishing at temperatures ranging from 40°C to 50°C and a second polishing phase at temperatures of 30°C or lower, ensuring optimal results.
Another notable invention is a chemically-mechanical polishing (CMP) slurry for metallic films. This formulation comprises water, polyvinylpyrrolidone, oxidizing agents, and specialized complexing agents tailored for forming both water-soluble and insoluble complexes. The innovativeness of this CMP slurry lies in its effectiveness in achieving fine finishes on semiconductor devices, essential for modern electronic applications.
Career Highlights
Throughout his career, Nobuyuki Kurashima has significantly impacted the semiconductor industry while working for leading organizations such as Kabushiki Kaisha Toshiba and JSR Corporation. His expertise has helped these companies to enhance their technological capabilities and maintain a competitive edge in a rapidly evolving market.
Collaborations
Kurashima has collaborated with notable industry professionals, including Gaku Minamihaba and Hiroyuki Yano. These collaborations have facilitated the sharing of knowledge and expertise essential for pioneering new inventions and improving existing methodologies in semiconductor technology.
Conclusion
Nobuyuki Kurashima's contributions to the field of semiconductor manufacturing are noteworthy. With a strong focus on innovation, his patents showcase a commitment to enhancing device performance and manufacturing processes. As he continues to push the boundaries of technology, his work undoubtedly enriches the landscape of modern electronics and semiconductor development.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile