Location History:
- Norwood, NY (US) (2005 - 2007)
- Potsdam, NY (US) (2003 - 2016)
- Heidelberg, DE (2013 - 2019)
- Mannheim, DE (2015 - 2019)
- (2015 - 2021)
Company Filing History:
Years Active: 2003-2021
Title: Yuzhuo Li: Innovator in Chemical-Mechanical Polishing Technologies
Introduction: Yuzhuo Li is a prominent inventor based in Heidelberg, Germany, recognized for his significant contributions to the field of chemical-mechanical polishing (CMP) technologies. With an impressive portfolio of 33 patents, Li's work primarily focuses on innovative compositions that enhance the manufacturing processes of semiconductor devices.
Latest Patents: Among his latest patents, Li has developed a chemical-mechanical polishing composition that incorporates benzotriazole derivatives as corrosion inhibitors. This novel composition consists of various compounds from the benzotriazole derivative group, which serve to protect substrates during the CMP process. The invention not only enhances the corrosion resistance of materials but also improves the selectivity for removing tantalum or tantalum nitride from semiconductor substrates that contain copper. This dual functionality is critical for advancing semiconductor manufacturing.
Career Highlights: Throughout his career, Yuzhuo Li has made notable strides in the fields of chemistry and material science. He has worked with esteemed organizations such as BASF SE and PPG Industries Ohio, Inc., where he applied his expertise to develop and refine various chemical compositions. His contributions have played a key role in advancing CMP technologies, which are vital for the production of sophisticated semiconductor devices.
Collaborations: Li has collaborated with prominent professionals in his field, notably including Vijay Immanuel Raman and Michael Lauter. These partnerships have fostered innovation and have been instrumental in bringing his patented technologies to fruition. Such collaborations have enhanced his work's impact on the semiconductor and materials science industries.
Conclusion: Yuzhuo Li's innovative approach to chemical-mechanical polishing compositions has made a lasting impact on semiconductor manufacturing processes. With his extensive patent portfolio and collaborative efforts, he continues to pave the way for advancements in the field, driving innovation that supports the evolving needs of technology.