The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2017

Filed:

Jan. 25, 2013
Applicant:

Basf SE, Ludwigshafen, DE;

Inventors:

Yuzhuo Li;

Bastian Marten Noller, Lorsch, DE;

Michael Lauter, Mannheim, DE;

Roland Lange, Limburgerhof, DE;

Assignee:

BASF SE, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 21/3105 (2006.01); C09K 3/14 (2006.01); H01L 21/306 (2006.01); C09G 1/18 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09G 1/18 (2013.01); C09K 3/1463 (2013.01); H01L 21/30625 (2013.01); H01L 21/31053 (2013.01);
Abstract

Chemical mechanical polishing composition is provided. The composition comprises (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a protein, and (C) an aqueous medium.


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