Bastian Marten Noller

This inventor holds 11 USPTO granted patents and 10 published patent applications, plus 1 CIPO patent and 7 EPO patents. Top assignees: Basf Se Corporation, Basf Agro B.v., Basf Corporation. Active years: 2013-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bastian Marten Noller. Retrieved from https://idiyas.com/inventor/bastian-marten-noller

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 (Patent Applications = 10)

% Patents Active = 45.5

CIPO Patents = 1

EPO Patents = 7 (Patent Applications = 23)

Average Co-Inventor Count = 5.2

ph-index = 2

Forward Citations = 18(Granted Patents)

Location History:

Lorsch, DE (2013 - 2019)
Neuhofen, DE (2019 - 2022)

Company Filing History:

St. Lawrence Nanotechnology

patent

where one patent can have more than one assignee

Years Active: 2013-2022

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11317628 - Microparticle compositions comprising saflufenacil (2022-05-03),

2. 10407594 - Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine (2019-09-10),

3. 10227506 - Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium (2019-03-12),

4. 10214663 - Chemical-mechanical polishing composition comprising organic/inorganic composite particles (2019-02-26),

5. 9777192 - Chemical mechanical polishing (CMP) composition comprising a protein (2017-10-03),

6. 9524874 - Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films (2016-12-20),

7. 9443739 - [object Object] (2016-09-13),

8. 9416298 - Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactant (2016-08-16),

9. 9263296 - Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors (2016-02-16),

10. 8657947 - Silylated amino resins (2014-02-25),

11. 8541320 - Silylated amino resins (2013-09-24),

Title: Bastian Marten Noller: Innovator in Microparticle Compositions

Introduction

Bastian Marten Noller is a notable inventor based in Lorsch, Germany. He has made significant contributions to the field of microparticle compositions, holding a total of 11 patents. His work focuses on innovative solutions for controlling undesired vegetation and enhancing chemical-mechanical polishing processes.

Latest Patents

One of Noller's latest patents is for microparticle compositions comprising saflufenacil. This invention relates to the preparation of microparticle compositions that utilize solid saflufenacil, which is either surrounded or embedded by an aminoplast polymer. This innovative approach aims to improve the effectiveness of controlling unwanted vegetation. Another significant patent involves a chemical-mechanical polishing (CMP) composition that includes a polymeric polyamine. This composition is designed to enhance the polishing process by incorporating various types of particles and an aqueous medium, showcasing Noller's expertise in chemical formulations.

Career Highlights

Throughout his career, Bastian Marten Noller has worked with prominent companies such as BASF SE Corporation and BASF Agro B.V. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in agricultural and chemical technologies.

Collaborations

Noller has collaborated with notable professionals in his field, including Yuzhuo Li and Michael Lauter. These partnerships have facilitated the exchange of ideas and expertise, further enhancing the impact of his inventions.

Conclusion

Bastian Marten Noller is a distinguished inventor whose work in microparticle compositions has led to significant advancements in both agricultural and chemical industries. His innovative patents and collaborations reflect his commitment to developing effective solutions for modern challenges.

Profile summary based on public USPTO records.