The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Mar. 19, 2012
Bastian Noller, Lorsch, DE;
Michael Lauter, Mannheim, DE;
Albert Budiman Sugiharto, Mannheim, DE;
Yuzhuo LI, Mannheim, DE;
Kenneth Rushing, Paw Paw, MI (US);
Diana Franz, Schifferstadt, DE;
Roland Böhn, Maxdorf, DE;
Bastian Noller, Lorsch, DE;
Michael Lauter, Mannheim, DE;
Albert Budiman Sugiharto, Mannheim, DE;
Yuzhuo Li, Mannheim, DE;
Kenneth Rushing, Paw Paw, MI (US);
Diana Franz, Schifferstadt, DE;
Roland Böhn, Maxdorf, DE;
BASF SE, Ludwigshafen, DE;
Abstract
A chemical-mechanical polishing ('CMP') composition (P) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of A/-heterocyclic compound as corrosion inhibitor, (C) at least one type of a further corrosion inhibitor selected from the group consisting of: (C1) an acetylene alcohol, and (C2) a salt or an adduct of (C2a) an amine, and (C2b) a carboxylic acid comprising an amide moiety, (D) at least one type of an oxidizing agent, (E) at least one type of a complexing agent, and (F) an aqueous medium.