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For the Inventor, By the Inventor

Mannheim, Germany

Michael Lauter

This inventor holds 22 USPTO granted patents and 13 published patent applications and 22 EPO patents, primarily in Chemical Mechanical Polishing. Top assignee: Basf Se Corporation. Active years: 2015-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael Lauter. Retrieved from https://idiyas.com/inventor/michael-lauter

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 22 

% Patents Active = 86.4

 

Average Co-Inventor Count = 6.4

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Mannheim, DE (2015 - 2022)
  • Ludwigshafen am Rhein, DE (2023)
  • Ludwigshafen, DE (2020 - 2024)

Company Filing History:

goldMedal22 out of 5,903 
 
Basf Se Corporation
 patents

Years Active: 2015-2025

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Areas of Expertise:
Tungsten Etching Inhibition
Chemical Mechanical Polishing
Copper Substrates
Ruthenium Substrates
Cobalt Alloy
Corrosion Inhibitors
Polymeric Polyamine
Germanium Substrates
Benzotriazole Derivatives
Non-Ionic Surfactant
Inorganic Particles
Glycoside
22 patents (USPTO):Explore Patents
1. 12378439 - Compositions for tungsten etching inhibition (2025-08-05),
2. 12351737 - Chemical mechanical polishing of substrates containing copper and ruthenium (2025-07-08),
3. 11993729 - Chemical mechanical polishing composition (2024-05-28),
4. 11725117 - Chemical mechanical polishing of substrates containing copper and ruthenium (2023-08-15),
5. 11286402 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2022-03-29),
6. 11264250 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2022-03-01),
7. 11168239 - Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors (2021-11-09),
8. 10899945 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates (2021-01-26),
9. 10865361 - Composition for post chemical-mechanical-polishing cleaning (2020-12-15),
10. 10844333 - Composition for post chemical-mechanical-polishing cleaning (2020-11-24),
11. 10844325 - Composition for post chemical-mechanical-polishing cleaning (2020-11-24),
12. 10738219 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2020-08-11),
13. 10647900 - Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors (2020-05-12),
14. 10570316 - Chemical mechanical polishing (CMP) composition (2020-02-25),
15. 10407594 - Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine (2019-09-10),

Title: Inventor Michael Lauter

Introduction: Michael Lauter is a renowned inventor based in Mannheim, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Michael Lauter holds several patents in the areas of renewable energy, sustainable transportation, and advanced materials, showcasing his innovative spirit and commitment to creating a more sustainable future.

Career Highlights: With a career spanning over two decades, Michael Lauter has worked with leading research institutions and companies to develop cutting-edge technologies that have had a significant impact on the industry. His dedication to pushing the boundaries of innovation has earned him recognition as a pioneer in his field.

Collaborations: Throughout his career, Michael Lauter has collaborated with top engineers, scientists, and inventors from around the world, fostering a culture of creativity and excellence. His collaborative efforts have led to the development of revolutionary products and solutions that have transformed the way we live and work.

Conclusion: Michael Lauter's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs. His contributions to the field of technology have left an indelible mark on society, shaping the future of innovation for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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