The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2024
Filed:
Nov. 12, 2018
Basf SE, Ludwigshafen am Rhein, DE;
Christian Daeschlein, Herne, DE;
Max Siebert, Ludwigshafen, DE;
Yongqing Lan, Ludwigshafen, DE;
Michael Lauter, Ludwigshafen, DE;
Sheik Ansar Usman Ibrahim, Waterloo, BE;
Reza M Golzarian, Hillsboro, OR (US);
Te Yu Wei, Taoyuan, TW;
Haci Osman Guevenc, Ludwigshafen, DE;
Julian Proelss, Ludwigshafen, DE;
Leonardus Leunissen, Veldhoven, NL;
BASF SE, , DE;
Abstract
The presently claimed subject matter is directed to a chemical mechanical polishing (CMP) composition comprising inorganic particles, at least one organic compound comprising an amino group and/or at least one acid group (Y), potassium persulfate, at least one corrosion inhibitor and an aqueous medium for polishing substrates of the semiconductor industry comprising cobalt and/or a cobalt alloy and TiN and/or TaN.