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Yongqing Lan

USPTO Granted Patents = 18 (Patent Applications = 4)

EPO Patents = 13 (Patent Applications = 17)

Average Co-Inventor Count = 6.3

ph-index = 2

Forward Citations = 14(Granted Patents)

Location History:

Potsdam, DE (2014)
Potsdam, NY (US) (2014 - 2019)
Ludwigshafen, DE (2017 - 2024)

Company Filing History:

St. Lawrence Nanotechnology

where one patent can have more than one assignee

Years Active: 2014-2024

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18 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11993729 - Chemical mechanical polishing composition (2024-05-28),

2. 11286402 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2022-03-29),

3. 11264250 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2022-03-01),

4. 10899945 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates (2021-01-26),

5. 10738219 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2020-08-11),

6. 10570316 - Chemical mechanical polishing (CMP) composition (2020-02-25),

7. 10407594 - Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine (2019-09-10),

8. 10392531 - Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process (2019-08-27),

9. 10385236 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2019-08-20),

10. 10227506 - Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium (2019-03-12),

11. 10214663 - Chemical-mechanical polishing composition comprising organic/inorganic composite particles (2019-02-26),

12. 10090159 - Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers (2018-10-02),

13. 9862862 - Chemical-mechanical polishing compositions comprising polyethylene imine (2018-01-09),

14. 9828527 - Chemical-mechanical polishing compositions comprising N,N,N',N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid (2017-11-28),

15. 9765239 - Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material (2017-09-19),

Title: **Yongqing Lan: Innovator in Chemical Mechanical Polishing Technologies**

Introduction

Yongqing Lan, based in Ludwigshafen, Germany, is an accomplished inventor with a remarkable portfolio of 18 patents. His work primarily focuses on the development of advanced chemical mechanical polishing (CMP) compositions, which are pivotal in semiconductor manufacturing. Lan's innovations have contributed significantly to enhancing the performance and efficiency of polishing processes in the semiconductor industry.

Latest Patents

Among Yongqing Lan's latest patents is a CMP composition that includes inorganic particles, organic compounds with amino groups, potassium persulfate, and corrosion inhibitors. This composition is tailored for polishing substrates that consist of cobalt or cobalt alloys, along with titanium nitride (TiN) and tantalum nitride (TaN). Another noteworthy patent involves the use of a CMP composition that features a triazine derivative and amino acids, designed specifically for substrates containing cobalt or cobalt alloys. The pH level of these innovative compositions ranges from 7 to 10, which optimizes performance in various polishing scenarios.

Career Highlights

Yongqing Lan has made significant contributions while working for organizations such as BASF SE Corporation and St. Lawrence Nanotechnology. His experience in these renowned companies has enabled him to enhance his expertise in chemical engineering and material sciences, positioning him as a leader in the field of CMP technologies.

Collaborations

Throughout his career, Lan has collaborated with notable colleagues including Julian Proelss and Michael Lauter. These collaborations have fostered an environment of shared innovation and creativity, leading to advancements in chemical polishing processes and materials.

Conclusion

Yongqing Lan’s ingenuity and commitment to innovation have made him a key figure in the development of chemical mechanical polishing technologies. With 18 patents to his name and ongoing collaborations with industry professionals, he continues to drive advancements that are essential to the semiconductor industry. His work not only highlights his inventiveness but also the importance of collaboration in fostering technological progress.

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