The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
Apr. 27, 2016
Basf SE, Ludwigshafen am Rhein, DE;
Robert Reichardt, Ludwigshafen am Rhein, DE;
Max Siebert, Ludwigshafen, DE;
Yongqing Lan, Ludwigshafen, DE;
Michael Lauter, Mannheim, DE;
Sheik Ansar Usman Ibrahim, Heverlee, BE;
Reza M Golzarian, Portland, OR (US);
Haci Osman Guevenc, Heidelberg, DE;
Julian Proelss, Worms, DE;
Leonardus Leunissen, Veldhoven, NL;
Abstract
Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) an anionic surfactant of the general formula (I) R-S wherein R is C-C-alkyl, C-C-alkenyl, C-C-alkylacyl or C-C-alkenylacyl and S is a sulfonic acid derivative, an amino acid derivative or a phosphoric acid derivative or salts or mixtures thereof (C) at least one amino acid, (D) at least one oxidizer (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.