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For the Inventor, By the Inventor

Worms, Germany

Julian Proelss

This inventor holds 17 USPTO granted patents and 3 published patent applications and 8 EPO patents, primarily in Chemical Mechanical Polishing. Top assignees: Basf Se Corporation, Basf Aktiengesellschaft. Active years: 2012-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Julian Proelss. Retrieved from https://idiyas.com/inventor/julian-proelss

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 76.5

 

Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Worms, DE (2012 - 2022)
  • Allschwil, CH (2023)
  • Ludwigshafen, DE (2020 - 2024)

Company Filing History:

goldMedal16 out of 5,903 
 
Basf Se Corporation
 patents
silverMedal1 out of 10,816 
 
Basf Aktiengesellschaft
 patents

Years Active: 2012-2024

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Areas of Expertise:
Chemical Mechanical Polishing
CMP Composition
Cobalt Substrates
Copper Substrates
Ruthenium
Nanoparticulate Materials
Polymers
Aqueous Etching Solution
Surface Texturing
Post-CMP Cleaning
17 patents (USPTO):Explore Patents
1. 11993729 - Chemical mechanical polishing composition (2024-05-28),
2. 11725117 - Chemical mechanical polishing of substrates containing copper and ruthenium (2023-08-15),
3. 11286402 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2022-03-29),
4. 11264250 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2022-03-01),
5. 10899945 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates (2021-01-26),
6. 10865361 - Composition for post chemical-mechanical-polishing cleaning (2020-12-15),
7. 10844333 - Composition for post chemical-mechanical-polishing cleaning (2020-11-24),
8. 10844325 - Composition for post chemical-mechanical-polishing cleaning (2020-11-24),
9. 10738219 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2020-08-11),
10. 10570316 - Chemical mechanical polishing (CMP) composition (2020-02-25),
11. 10385236 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2019-08-20),
12. 10090159 - Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers (2018-10-02),
13. 9862862 - Chemical-mechanical polishing compositions comprising polyethylene imine (2018-01-09),
14. 9828527 - Chemical-mechanical polishing compositions comprising N,N,N',N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid (2017-11-28),
15. 9765239 - Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material (2017-09-19),

Title: The Innovations of Julian Proelss

Introduction

Julian Proelss is a notable inventor based in Worms, Germany. He has made significant contributions to the field of chemical mechanical polishing, particularly in the semiconductor industry. With a total of 17 patents to his name, Proelss has developed innovative solutions that enhance the efficiency and effectiveness of polishing processes.

Latest Patents

Among his latest patents, Proelss has developed a chemical mechanical polishing composition that includes inorganic particles, organic compounds with amino and/or acid groups, potassium persulfate, corrosion inhibitors, and an aqueous medium. This composition is specifically designed for polishing substrates in the semiconductor industry that contain cobalt and/or cobalt alloys, as well as TiN and/or TaN. Another significant patent focuses on a CMP composition and methods for polishing substrates containing copper and ruthenium, which are essential materials in semiconductor manufacturing.

Career Highlights

Throughout his career, Julian Proelss has worked with prominent companies such as BASF SE Corporation and BASF Aktiengesellschaft. His work in these organizations has allowed him to refine his expertise in chemical mechanical polishing and contribute to advancements in the field.

Collaborations

Proelss has collaborated with notable professionals in his field, including Yongqing Lan and Michael Lauter. These collaborations have further enriched his work and led to innovative developments in chemical mechanical polishing technologies.

Conclusion

Julian Proelss is a distinguished inventor whose contributions to chemical mechanical polishing have significantly impacted the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing technology in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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