The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Aug. 09, 2016
Basf SE, Ludwigshafen, DE;
Robert Reichardt, Ludwigshafen am Rhein, DE;
Max Siebert, Ludwigshafen, DE;
Yongqing Lan, Ludwigshafen, DE;
Michael Lauter, Mannheim, DE;
Sheik Ansar Usman Ibrahim, Heverlee, BE;
Reza M. Golzarian, Portland, OR (US);
Te Yu Wei, Taoyuan, TW;
Haci Osman Guevenc, Heidelberg, DE;
Julian Proelss, Worms, DE;
Leonardus Leunissen, Ludwigshafen, DE;
BASF SE, Ludwigshafen, DE;
Abstract
Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy and (iii) Ti N and/or TaN, wherein the CMP composition (Q) comprises (E) Inorganic particles (F) at least one organic compound comprising an amino-group and an acid group (Y), wherein said compound comprises n amino groups and at least n+1 acidic protons, wherein n is a integer≥1. (G) at least one oxidizer in an amount of from 0.2 to 2.5 wt.-% based on the total weight of the respective CMP composition, (H) an aqueous medium wherein the CMP composition (Q) has a pH of more than 6 and less than 9.