logo

For the Inventor, By the Inventor

Heidelberg, Germany

Haci Osman Guevenc

This inventor holds 14 USPTO granted patents and 8 published patent applications and 10 EPO patents. Top assignee: Basf Se Corporation. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haci Osman Guevenc. Retrieved from https://idiyas.com/inventor/haci-osman-guevenc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.7

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Heidelberg, DE (2019 - 2022)
  • Ludwigshafen am Rhein, DE (2023)
  • Ludwigshafen, DE (2020 - 2024)

Company Filing History:

goldMedal14 out of 5,902 
 
Basf Se Corporation
 patents

Years Active: 2019-2026

Loading Chart...
Loading Chart...
14 patents (USPTO):Explore Patents
1. 12518960 - Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 NM or below (2026-01-06),
2. 12378439 - Compositions for tungsten etching inhibition (2025-08-05),
3. 12351737 - Chemical mechanical polishing of substrates containing copper and ruthenium (2025-07-08),
4. 11993729 - Chemical mechanical polishing composition (2024-05-28),
5. 11725117 - Chemical mechanical polishing of substrates containing copper and ruthenium (2023-08-15),
6. 11286402 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2022-03-29),
7. 11264250 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2022-03-01),
8. 10899945 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates (2021-01-26),
9. 10865361 - Composition for post chemical-mechanical-polishing cleaning (2020-12-15),
10. 10844333 - Composition for post chemical-mechanical-polishing cleaning (2020-11-24),
11. 10844325 - Composition for post chemical-mechanical-polishing cleaning (2020-11-24),
12. 10738219 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2020-08-11),
13. 10570316 - Chemical mechanical polishing (CMP) composition (2020-02-25),
14. 10385236 - Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates (2019-08-20),

Title: Haci Osman Guevenc: Innovator in Chemical Engineering

Introduction

Haci Osman Guevenc is a prominent inventor based in Heidelberg, Germany. He has made significant contributions to the field of chemical engineering, particularly in the area of semiconductor processing. With a total of 14 patents to his name, Guevenc has established himself as a key figure in innovation.

Latest Patents

Guevenc's latest patents include groundbreaking work on compositions for tungsten etching inhibition. This invention relates to compositions and methods designed to inhibit the etching of tungsten, which is crucial in semiconductor manufacturing. Another notable patent focuses on chemical mechanical polishing (CMP) of substrates containing copper and ruthenium. This invention outlines a CMP composition and methods specifically tailored for semiconductor substrates, enhancing the efficiency and effectiveness of the polishing process.

Career Highlights

Haci Osman Guevenc is currently associated with BASF SE Corporation, where he applies his expertise in chemical engineering to develop innovative solutions. His work has significantly impacted the semiconductor industry, providing essential advancements in material processing.

Collaborations

Guevenc has collaborated with notable colleagues, including Michael Lauter and Julian Proelss. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Haci Osman Guevenc's contributions to chemical engineering and semiconductor processing are noteworthy. His patents reflect a commitment to innovation and excellence in his field. Through his work at BASF SE Corporation, he continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…