The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
May. 31, 2017
Basf SE, Ludwigshafen am Rhein, DE;
Christian Daeschlein, Herne, DE;
Max Siebert, Ludwigshafen, DE;
Michael Lauter, Ludwigshafen, DE;
Leonardus Leunissen, Veldhoven, NL;
Ivan Garcia Romero, Ludwigshafen, DE;
Haci Osman Guevenc, Ludwigshafen, DE;
Peter Przybylski, Ludwigshafen, DE;
Julian Proelss, Ludwigshafen, DE;
Andreas Klipp, Ludwigshafen, DE;
BASF SE, Ludwigshafen am Rhein, DE;
Abstract
Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more water-soluble nonionic copolymers of the general formula (I) and mixtures thereof, formula (I) wherein Rand Rare independently from each other hydrogen, methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-Butyl, or sec-butyl, Ris methyl and x and y are an integer, 1 (B)poly(acrylic acid) (PAA) or acrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/mol, and (C) water, wherein the pH of the composition is in the range of from 7.0 to 10.5.