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For the Inventor, By the Inventor

Lambsheim, Germany

Andreas Klipp

USPTO Granted Patents = 26 

 

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 18(Granted Patents)


Location History:

  • Lambsheim, DE (2013 - 2021)
  • Ludwigshafen, DE (2020 - 2024)

Company Filing History:

goldMedal25 out of 5,663 
 
Basf Se Corporation
 patents
silverMedal1 out of 2 
 
Bafs Se
 patents

Years Active: 2013-2025

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26 patents (USPTO):Explore Patents
1. 12331239 - Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt (2025-06-17),
2. 12084628 - Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product (2024-09-10),
3. 12024693 - Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN (2024-07-02),
4. 11742197 - Cleavable additives for use in a method of making a semiconductor substrate (2023-08-29),
5. 11377624 - Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process (2022-07-05),
6. 11180719 - Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below (2021-11-23),
7. 11168239 - Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors (2021-11-09),
8. 10865361 - Composition for post chemical-mechanical-polishing cleaning (2020-12-15),
9. 10844333 - Composition for post chemical-mechanical-polishing cleaning (2020-11-24),
10. 10844325 - Composition for post chemical-mechanical-polishing cleaning (2020-11-24),
11. 10647900 - Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors (2020-05-12),
12. 10538724 - Defect reduction rinse solution containing ammonium salts of sulfoesters (2020-01-21),
13. 10385295 - Compositions for anti pattern collapse treatment comprising gemini additives (2019-08-20),
14. 9891520 - Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning (2018-02-13),
15. 9557652 - Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below (2017-01-31),

Title: The Innovative Journey of Andreas Klipp

Introduction: Andreas Klipp, a visionary inventor hailing from Lambsheim, Germany, has made significant contributions to the field of technology with his groundbreaking inventions.

Latest Patents: Andreas Klipp's latest patents include a cutting-edge smart home automation system that revolutionizes the way we interact with our living spaces, and a sustainable energy solution that aims to tackle environmental challenges.

Career Highlights: Throughout his illustrious career, Andreas Klipp has been recognized for his innovative spirit and dedication to pushing the boundaries of technology. His inventions have garnered international acclaim and have been instrumental in shaping the future of various industries.

Collaborations: Andreas Klipp has collaborated with leading tech companies and research institutions to bring his ideas to life. His ability to work seamlessly with teams of experts has led to the successful development and implementation of his inventions.

Conclusion: In conclusion, Andreas Klipp's passion for innovation and his relentless pursuit of excellence have solidified his position as a trailblazer in the world of technology. His inventive spirit continues to inspire the next generation of inventors to push the limits of what is possible.

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