logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11377624 B1

PDFFull Text
Date of Patent:
Jul. 05, 2022

Filed:

Dec. 05, 2018

Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process

Applicant:

Basf SE, Ludwigshafen am Rhein, DE;

Inventors:

Jhih Jheng Ke, Taoyuan, TW;

Andreas Klipp, Ludwigshafen, DE;

Yi Ping Cheng, Taoyuan, TW;

Joannes Theodorus Valentinus Hoogboom, Ludwigshafen, DE;

Assignee:

BASF SE, Ludwigshafen am Rhein, DE;

Attorney:

Armstrong Teasdale LLP

Primary Examiner:

Gregory E Webb

Int. Cl.
CPC ...
C11D 7/08 (2006.01); C11D 3/24 (2006.01); C11D 3/00 (2006.01); C11D 3/20 (2006.01); C11D 3/30 (2006.01); C11D 3/34 (2006.01); C11D 11/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C11D 3/245 (2013.01); C11D 3/0073 (2013.01); C11D 3/2086 (2013.01); C11D 3/30 (2013.01); C11D 3/3409 (2013.01); C11D 11/0047 (2013.01); H01L 21/02063 (2013.01);
Abstract

A cleaning composition for post-etch or post ash residue removal from a substrate used in semiconductor industry and a corresponding use of said cleaning composition is described. Further described is a process for the manufacture of a semiconductor device from a semiconductor substrate, comprising the step of post-etch or post ash residue removal from a substrate by contacting the substrate with a cleaning composition according to the invention.

Find Patent Forward Citations

Ke, Jhih. (2022). Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process (U.S. Patent No. 11377624). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11377624

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…