Jhih Jheng Ke

Title: Jhih Jheng Ke: Innovator in Semiconductor Technology

Introduction

Jhih Jheng Ke is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative processes and compositions that enhance semiconductor manufacturing.

Latest Patents

Jhih Jheng Ke's latest patents include a composition and process for selectively etching a layer comprising an aluminum compound in the presence of layers of low-k materials, copper, and/or cobalt. This invention describes a method for manufacturing semiconductor devices by selectively etching aluminum compounds while maintaining the integrity of surrounding materials. Another notable patent involves imidazolidinethione-containing compositions for post-ash residue removal and oxidative etching of layers or masks comprising TiN. This cleaning composition is designed for effective residue removal from semiconductor substrates and can be used in combination with oxidants for enhanced etching processes.

Career Highlights

Jhih Jheng Ke is currently employed at BASF SE Corporation, where he continues to develop innovative solutions in semiconductor technology. His expertise in etching processes and cleaning compositions has positioned him as a key player in the industry.

Collaborations

Jhih Jheng Ke has collaborated with notable colleagues, including Joannes Theodorus Valentinus Hoogboom and Andreas Klipp. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jhih Jheng Ke's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively, paving the way for future advancements.