The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Dec. 20, 2016
Basf SE, Ludwigshafen am Rhein, DE;
Christian Daeschlein, Bochum, DE;
Max Siebert, Ludwigshafen, DE;
Michael Lauter, Mannheim, DE;
Piotr Przybylski, Ludwigshafen, DE;
Julian Proelss, Worms, DE;
Andreas Klipp, Lambsheim, DE;
Haci Osman Guevenc, Heidelberg, DE;
Leonardos Leunissen, Ludwigshafen, DE;
Roelf-Peter Baumann, Mannheim, DE;
Te Yu Wei, Taoyuan, TW;
BASF SE, Ludwigshafen am Rhein, DE;
Abstract
Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more nonionic polymers selected from the group consisting of poly-acrylamides, polyhydroxyethyl(meth)acrylates (PHE(M)A), polyvinylpyrrolidone (PVP), polyvinyl alcohol (PVA), polymers of formula (I), and mixtures thereof, wherein R1 is hydrogen, methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, or sec-butyl, R2 is hydrogen or methyl, and n is an integer, (B) poly(acrylic acid) (PAA) or acrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/mol, and (C) water, wherein the pH of the composition is in the range of from 7.0 to 10.5.