The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Oct. 29, 2018
Basf SE, Ludwigshafen am Rhein, DE;
Daniel Loeffler, Ludwigshafen, DE;
Mei Chin Shen, Taoyuan, TW;
Sheng Hsuan Wei, Hillsboro, OR (US);
Frank Pirrung, Ludwigshafen, DE;
Lothar Engelbrecht, Berlin, DE;
Yeni Burk, Ludwigshafen, DE;
Andreas Klipp, Ludwigshafen, DE;
Marcel Brill, Ludwigshafen, DE;
Szilard Csihony, Ludwigshafen, DE;
BASF SE, Ludwigshafen am Rhein, DE;
Abstract
The invention relates to the use of a non-aqueous composition comprising an organic solvent and at least one particular siloxane-type additive for treating substrates comprising patterns having line-space dimensions of 50 nm or below and aspect ratios of 4 or more as well as a method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm, aspect ratios of greater or equal 4, or a combination thereof, (2) contacting the substrate at least once with a non-aqueous composition, and (3) removing the non-aqueous composition from the contact with the substrate, wherein the non-aqueous composition comprising an organic solvent and at least one of such siloxane-type additives.