The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2016
Filed:
Dec. 07, 2011
Shyam Sundar Venkataraman, Zhongli, TW;
Eason Yu-shen Su, New Taipei, TW;
Arend Jouke Kingma, Ludwigshafen, DE;
Bastian Marten Noller, Lorsch, DE;
Shyam Sundar Venkataraman, Zhongli, TW;
Eason Yu-Shen Su, New Taipei, TW;
Arend Jouke Kingma, Ludwigshafen, DE;
Bastian Marten Noller, Lorsch, DE;
BASF SE, Ludwigshafen, DE;
Abstract
An aqueous polishing composition comprising (A) abrasive ceria particles and (B) amphiphilic nonionic surfactants selected water-soluble and water-dispersible, linear and branched polyoxyalkylene blockcopolymers of the general formula I: R[(B1)/(B2)Y](I), wherein the indices and the variables have the following meaning: m, n, and p integers≧1; R hydrogen atom or monovalent or polyvalent organic residue, except C-Calkyl groups; (B1) block of oxyethylene monomer units; (B2) block of substituted oxyalkylene monomer units wherein the substituents are selected from two methyl groups, alkyl groups of more than two carbon atoms and cycloalkyl, aryl, alkyl-cycloalkyl, alkyl-aryl, cycloalkyl-aryl and alkyl-cycloalkyl-aryl groups; and Y hydrogen atom or monovalent organic residue, except C-Calkyl groups; with the proviso that when (B) contains more than one block (B1) or (B2) two blocks of the same type are separated by a block of the other type.