Eason Yu-Shen Su

Title: Eason Yu-Shen Su: Innovator in Chemical Mechanical Polishing

Introduction

Eason Yu-Shen Su is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 3 patents. His work focuses on developing innovative polishing compositions that enhance the performance of substrates in various applications.

Latest Patents

Eason's latest patents include an aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films. This composition comprises abrasive ceria particles and amphiphilic nonionic surfactants, which are essential for effective polishing. Another notable patent is a chemical mechanical polishing composition that includes polyvinyl phosphonic acid and its derivatives. This composition features a mixture of inorganic and organic particles, along with an organic polymeric compound that acts as a dispersing agent.

Career Highlights

Eason Yu-Shen Su is currently employed at BASF SE Corporation, where he continues to innovate in the field of chemical mechanical polishing. His expertise and dedication to research have positioned him as a key player in the industry.

Collaborations

Eason has collaborated with notable colleagues such as Shyam Sundar Venkataraman and Arend Jouke Kingma, contributing to advancements in their shared field of expertise.

Conclusion

Eason Yu-Shen Su's contributions to chemical mechanical polishing through his patents and work at BASF SE Corporation highlight his role as an influential inventor. His innovative approaches continue to shape the industry and improve polishing processes.