The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2016
Filed:
Dec. 21, 2011
Vijay Immanuel Raman, Mannheim, DE;
Yuzhuo LI, Mannheim, DE;
Christian Schade, Ludwigshafen, DE;
Shyam Sundar Venkataraman, Ludwigshafen, DE;
Eason Yu-shen Su, New Taipei, TW;
Sheik Ansar Usman Ibrahim, Potsdam, NY (US);
Vijay Immanuel Raman, Mannheim, DE;
Yuzhuo Li, Mannheim, DE;
Christian Schade, Ludwigshafen, DE;
Shyam Sundar Venkataraman, Ludwigshafen, DE;
Eason Yu-Shen Su, New Taipei, TW;
Sheik Ansar Usman Ibrahim, Potsdam, NY (US);
BASF SE, Ludwigshafen, DE;
Abstract
A chemical mechanical polishing (CMP) composition comprising: (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of an organic polymeric compound as a dispersing agent or charge reversal agent comprising a phosphonate (P(═O)(OR1)(OR2) or phosphonic acid (P(═O)(OH)2) moiety or their deprotonated forms as pendant groups, wherein Ris alkyl, aryl, alkylaryl, or arylalkyl, Ris H, alkyl, aryl, alkylaryl, or arylalkyl, and (C) an aqueous medium.