Zhongli, Taiwan

Shyam Sundar Venkataraman

This inventor holds 7 USPTO granted patents and 5 published patent applications and 6 EPO patents. Top assignee: Basf Se Corporation. Active years: 2015-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shyam Sundar Venkataraman. Retrieved from https://idiyas.com/inventor/shyam-sundar-venkataraman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7 

% Patents Active = 42.9

 

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Ludwigshafen, DE (2015 - 2016)
  • Zhongli, TW (2016)
  • Florham Park, NJ (US) (2021)

Company Filing History:


Years Active: 2015-2021

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7 patents (USPTO):Explore Patents

Title: Innovations of Shyam Sundar Venkataraman

Introduction

Shyam Sundar Venkataraman is a notable inventor based in Zhongli, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of advanced materials for various applications. With a total of 7 patents to his name, his work continues to influence the industry.

Latest Patents

One of his latest patents is titled "Metal-doped tin oxide for electrocatalysis applications." This invention relates to a metal-doped tin oxide that has a BET surface area of at least 30 m²/g. It comprises at least one metal dopant, which can be antimony (Sb), niobium (Nb), tantalum (Ta), bismuth (Bi), tungsten (W), or indium (In), or any mixture thereof. The metal dopant is present in an amount ranging from 2.5 at % to 25 at %, based on the total amount of tin and metal dopant atoms. The invention also describes a mixed valence state containing atoms of oxidation state OS1 and OS2, with specific atomic ratios.

Another significant patent is for an "Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films." This composition includes abrasive ceria particles and amphiphilic nonionic surfactants that are selected to be water-soluble and water-dispersible. The formulation is designed to enhance the polishing process of silicon oxide and polysilicon substrates.

Career Highlights

Shyam Sundar Venkataraman is currently employed at BASF SE Corporation, where he continues to innovate and develop new materials. His expertise in materials science has positioned him as a key player in his field.

Collaborations

He has collaborated with notable coworkers, including Eason Yu-Shen Su and Vijay Immanuel Raman, contributing to various projects and advancements in their respective areas of expertise.

Conclusion

Shyam Sundar Venkataraman's contributions to materials science through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to pave the way for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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