The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
Nov. 10, 2010
Chemical mechanical polishing (cmp) composition comprising inorganic particles and polymer particles
Michael Lauter, Mannheim, DE;
Vijay Immanuel Raman, Mannheim, DE;
Yuzhuo LI, Heidelberg, DE;
Shyam Sundar Venkataraman, Zhongli, TW;
Daniel Kwo-hung Shen, Junghe, TW;
Michael Lauter, Mannheim, DE;
Vijay Immanuel Raman, Mannheim, DE;
Yuzhuo Li, Heidelberg, DE;
Shyam Sundar Venkataraman, Zhongli, TW;
Daniel Kwo-Hung Shen, Junghe, TW;
BASF SE, Ludwigshafen, DE;
Abstract
A chemical mechanical polishing (CMP) composition, comprising (A) at least one type of inorganic particles which are dispersed in the liquid medium (C), (B) at least one type of polymer particles which are dispersed in the liquid medium (C), (C) a liquid medium, wherein the zeta-potential of the inorganic particles (A) in the liquid medium (C) and the zeta-potential of the polymer particles in the liquid medium (C) are of same signs.