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Years Active: 2016-2019
Title: The Innovative Contributions of Daniel Kwo-Hung Shen
Introduction
Daniel Kwo-Hung Shen is a notable inventor based in Junghe, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of 4 patents to his name. His work has been instrumental in advancing technologies used in semiconductor manufacturing.
Latest Patents
Among his latest patents, Shen has developed a chemical-mechanical polishing (CMP) composition that comprises a polymeric polyamine. This composition includes inorganic and organic particles, along with a variety of functional groups that enhance its effectiveness. Another notable patent involves a CMP composition featuring organic/inorganic composite particles, which are utilized as abrasive materials in semiconductor device manufacturing processes.
Career Highlights
Throughout his career, Daniel Shen has worked with prominent companies such as BASF SE Corporation and St. Lawrence Nanotechnology. His experience in these organizations has allowed him to refine his expertise in chemical engineering and materials science, contributing to his innovative patent portfolio.
Collaborations
Shen has collaborated with several professionals in his field, including Yuzhuo Li and Michael Lauter. These collaborations have fostered a productive exchange of ideas and have furthered advancements in CMP technologies.
Conclusion
Daniel Kwo-Hung Shen's contributions to the field of chemical mechanical polishing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing semiconductor manufacturing technologies.