The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Jan. 24, 2013
Applicant:
Basf SE, Ludwigshafen, DE;
Inventors:
Assignee:
BASF SE, Ludwigshafen, DE;
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/34 (2006.01); C11D 3/34 (2006.01); H01L 21/02 (2006.01); C11D 3/20 (2006.01); C11D 7/26 (2006.01); C11D 11/00 (2006.01); C11D 3/37 (2006.01);
U.S. Cl.
CPC ...
C11D 3/3427 (2013.01); C11D 3/2065 (2013.01); C11D 3/349 (2013.01); C11D 3/3757 (2013.01); C11D 7/261 (2013.01); C11D 7/268 (2013.01); C11D 7/34 (2013.01); C11D 11/0047 (2013.01); C11D 11/0064 (2013.01); H01L 21/02074 (2013.01);
Abstract
A post chemical-mechanical-polishing (post-CMP) cleaning composition comprising: (A) at least one compound comprising at least one thiol (—SH), thioether (—SR) or thiocarbonyl (>C═S) group, wherein Ris alkyl, aryl, alkylaryl or arylalkyl, (B) at least one sugar alcohol which contains at least three hydroxyl (—OH) groups and does not comprise any carboxylic acid (—COOH) or carboxylate (—COO—) groups, and (C) an aqueous medium.