Tosu, Japan

Yuji Kamikawa



Average Co-Inventor Count = 2.1

ph-index = 16

Forward Citations = 849(Granted Patents)


Inventors with similar research interests:


Location History:

  • Uto, JP (1993 - 1996)
  • Kikuchi-gun, JP (2000 - 2002)
  • Koshimachi, JP (1999 - 2005)
  • Kumamoto-ken, JP (1999 - 2007)
  • Saga, JP (2015)
  • Kumamoto, JP (2015)
  • Tosu, JP (2001 - 2016)
  • Tokyo, JP (2016)
  • Koshi, JP (2013 - 2020)

Company Filing History:


Years Active: 1993-2020

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Areas of Expertise:
Nozzle Cleaning
Substrate Processing
Evaporator Technology
Ultrasonic Cleaning
Liquid Processing
Semiconductor Fabrication
Vapor Drying
Fluid Heating
Cleaning Equipment
Batch Forming
Rotary Sealing Mechanism
Resist Film Removal
84 patents (USPTO):Explore Patents

Title: Innovations of Yuji Kamikawa: A Pioneer in Substrate Processing Technologies

Introduction

Yuji Kamikawa, a prolific inventor based in Tosu, Japan, has made significant contributions to the field of substrate processing with a remarkable portfolio of 84 patents. His innovative approaches have enhanced efficiencies in cleaning technologies, particularly for nozzles and substrates in various manufacturing processes.

Latest Patents

Kamikawa's recent inventions include a nozzle cleaning device, a nozzle cleaning method, and a substrate processing apparatus. The nozzle cleaning device is designed to uniformly clean a nozzle from its front end to its upper part. This device incorporates a storage tank with a cylindrical inner surface that holds a cleaning liquid used in substrate processes, and features both a liquid discharging portion to create a vortex flow and an overflow discharging portion for excess liquid.

Additionally, the substrate cleaning method he developed allows for efficient removal of particles from the entire surface of a substrate. This method involves immersing the substrate in a cleaning liquid while generating ultrasonic waves that enhance the cleaning efficacy. Furthermore, it incorporates a technique of varying the dissolved gas concentration in the cleaning liquid during the process, thereby optimizing cleaning results.

Career Highlights

Yuji Kamikawa has had an impressive career, contributing to key companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His work has been instrumental in advancing manufacturing technologies and has earned him recognition within the industry.

Collaborations

Throughout his career, Kamikawa has collaborated with fellow innovators, including Kinya Ueno and Naoki Shindo. Their collective expertise has contributed to the development of advanced cleaning methods and technologies, further pushing the boundaries of substrate processing.

Conclusion

As a leading figure in the field of substrate processing technology, Yuji Kamikawa continues to innovate and inspire with his vast array of patents. His inventions not only improve manufacturing efficiency but also underscore the important role of patents in fostering innovation and progress in technological fields.

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