The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

Dec. 10, 2012
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Tsukasa Watanabe, Tokyo, JP;

Naoki Shindo, Tokyo, JP;

Takahiro Furukawa, Tokyo, JP;

Yuji Kamikawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/12 (2006.01); B01F 15/00 (2006.01); B01F 15/04 (2006.01); B08B 3/00 (2006.01); C11D 11/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 3/12 (2013.01); B01F 15/0022 (2013.01); B01F 15/00207 (2013.01); B01F 15/0429 (2013.01); B08B 3/00 (2013.01); C11D 11/0047 (2013.01); H01L 21/67057 (2013.01);
Abstract

The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank, so that the substrate to be processed W is subjected to an ultrasonic cleaning process. While the substrate to be processed is being cleaned, a dissolved gas concentration of a gas dissolved in the cleaning liquid contained in the cleaning tank is changed.


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