Kurume, Japan

Takahiro Furukawa



Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Tosu, JP (2003 - 2013)
  • Tokyo, JP (2016)
  • Kumamoto, JP (2018)
  • Kurume, JP (2019 - 2021)

Company Filing History:


Years Active: 2003-2021

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6 patents (USPTO):Explore Patents

Title: Takahiro Furukawa: Innovator in Nitride Processing Technologies

Introduction

Takahiro Furukawa is a prominent inventor based in Kurume, Japan. He has made significant contributions to the field of nitride processing technologies, holding a total of 6 patents. His work focuses on improving the efficiency and effectiveness of silicon nitride etching processes.

Latest Patents

One of Furukawa's latest patents is titled "Process and apparatus for processing a nitride structure without silica deposition." This innovation provides techniques to remove the growth of colloidal silica deposits on surfaces of high aspect ratio structures during silicon nitride etch steps. A high selectivity overetch step is utilized to eliminate the deposited colloidal silica. The techniques disclosed include the use of phosphoric acid to remove silicon nitride from structures formed in narrow gaps or trench structures. These structures often experience the formation of colloidal silica deposits through hydrolysis reactions. A second etch step is employed, where the hydrolysis reaction that formed the colloidal silica deposits is reversible. With the lower concentration of silica in the nearby phosphoric acid due to the depletion of silicon nitride, the equilibrium drives the reaction in the reverse direction, effectively dissolving the deposited silica back into solution.

Career Highlights

Furukawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing nitride processing technologies.

Collaborations

Throughout his career, Takahiro Furukawa has collaborated with notable colleagues, including Derek Bassett and Wallace Paul Printz. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Takahiro Furukawa is a key figure in the advancement of nitride processing technologies, with a focus on improving silicon nitride etching processes. His contributions through patents and collaborations continue to influence the semiconductor industry.

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