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For the Inventor, By the Inventor

Nirasaki, Japan

Naoki Shindo

USPTO Granted Patents = 42


Average Co-Inventor Count = 3.5

ph-index = 8

Forward Citations = 195(Granted Patents)


Location History:

  • Kurume, JP (2000 - 2003)
  • Tokyo, JP (2016)
  • Koshi, JP (2015 - 2017)
  • Yamanashi, JP (2018)
  • Nirasaki, JP (1998 - 2023)

Company Filing History:

goldMedal42 out of 10,326 
 
Tokyo Electron Limited
 patents

Years Active: 1998-2025

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Areas of Expertise:
Substrate Processing
Etching Apparatus
Nozzle Cleaning Device
Titanium Oxide Film
Liquid Treatment
Semiconductor Manufacturing
Substrate Cleaning
Drying Mechanism
Cleaning Equipment
Liquid Processing
Substrate Washing
Fluid Mixture
42 patents (USPTO):Explore Patents
1. 12381094 - Substrate processing apparatus and substrate processing method (2025-08-05),
2. 12283489 - Etching method and etching apparatus (2025-04-21),
3. 12272541 - Etching method and etching apparatus (2025-04-08),
4. 11764070 - Etching method and etching apparatus (2023-09-19),
5. 11335567 - Etching method and etching apparatus (2022-05-17),
6. 10700166 - Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatus (2020-06-30),
7. 10535528 - Method of forming titanium oxide film and method of forming hard mask (2020-01-14),
8. 9922849 - Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof (2018-03-20),
9. 9768010 - Liquid treatment apparatus (2017-09-19),
10. 9691602 - Liquid process apparatus and liquid process method (2017-06-27),
11. 9358588 - Substrate cleaning method, substrate cleaning system and program storage medium (2016-06-07),
12. 9202731 - Liquid processing apparatus, liquid processing method, and recording medium having program for executing liquid processing method recorded therein (2015-12-01),
13. 9190311 - Liquid arm cleaning unit for substrate processing apparatus (2015-11-17),
14. 9177838 - Liquid process apparatus and liquid process method (2015-11-03),
15. 8449684 - Substrate cleaning method, substrate cleaning system and program storage medium (2013-05-28),

Title: Naoki Shindo: Pioneering Inventor from Nirasaki

Introduction: Naoki Shindo is a renowned inventor hailing from Nirasaki, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Naoki Shindo's latest patents include cutting-edge advancements in artificial intelligence, robotics, and sustainable energy solutions, showcasing his commitment to pushing the boundaries of technological development.

Career Highlights: With a career spanning over two decades, Naoki Shindo has worked with leading research institutions and tech companies, consistently delivering innovative solutions that have revolutionized various industries.

Collaborations: Throughout his career, Naoki Shindo has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of creativity and excellence in all his projects.

Conclusion: Naoki Shindo's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

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