Naoki Shindo

This inventor holds 43 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Substrate Processing. Top assignee: Tokyo Electron Limited. Active years: 1998-2026.

USPTO Granted Patents = 43 (Patent Applications = 1)

% Patents Active = 69.8

EPO Patents = 1

Average Co-Inventor Count = 3.5

ph-index = 8

Forward Citations = 198(Granted Patents)

Location History:

Kurume, JP (2000 - 2003)
Tokyo, JP (2016)
Koshi, JP (2015 - 2017)
Yamanashi, JP (2018)
Nirasaki, JP (1998 - 2023)

Company Filing History:

43 out of 10,837

Tokyo Electron Limited

patents

Years Active: 1998-2026

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Areas of Expertise:

Etching Method

Substrate Processing

Cleaning Apparatus

Liquid Treatment

Titanium Oxide Film

Nozzle Cleaning

Substrate Drying

Semiconductor Device

Flow Paths

Hard Mask

Liquid Processing

43 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12575352 - Etching method and etching apparatus (2026-03-10),

2. 12381094 - Substrate processing apparatus and substrate processing method (2025-08-05),

3. 12283489 - Etching method and etching apparatus (2025-04-21),

4. 12272541 - Etching method and etching apparatus (2025-04-08),

5. 11764070 - Etching method and etching apparatus (2023-09-19),

6. 11335567 - Etching method and etching apparatus (2022-05-17),

7. 10700166 - Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatus (2020-06-30),

8. 10535528 - Method of forming titanium oxide film and method of forming hard mask (2020-01-14),

9. 9922849 - Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof (2018-03-20),

10. 9768010 - Liquid treatment apparatus (2017-09-19),

11. 9691602 - Liquid process apparatus and liquid process method (2017-06-27),

12. 9358588 - Substrate cleaning method, substrate cleaning system and program storage medium (2016-06-07),

13. 9202731 - Liquid processing apparatus, liquid processing method, and recording medium having program for executing liquid processing method recorded therein (2015-12-01),

14. 9190311 - Liquid arm cleaning unit for substrate processing apparatus (2015-11-17),

15. 9177838 - Liquid process apparatus and liquid process method (2015-11-03),

Title: Naoki Shindo: Pioneering Inventor from Nirasaki

Introduction: Naoki Shindo is a renowned inventor hailing from Nirasaki, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Naoki Shindo's latest patents include cutting-edge advancements in artificial intelligence, robotics, and sustainable energy solutions, showcasing his commitment to pushing the boundaries of technological development.

Career Highlights: With a career spanning over two decades, Naoki Shindo has worked with leading research institutions and tech companies, consistently delivering innovative solutions that have revolutionized various industries.

Collaborations: Throughout his career, Naoki Shindo has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of creativity and excellence in all his projects.

Conclusion: Naoki Shindo's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.