The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Jan. 17, 2012
Jiro Higashijima, Koshi, JP;
Yosuke Hachiya, Koshi, JP;
Kazuhiro Aiura, Koshi, JP;
Norihiro Itoh, Koshi, JP;
Naoki Shindo, Koshi, JP;
Yuki Ito, Koshi, JP;
Jiro Higashijima, Koshi, JP;
Yosuke Hachiya, Koshi, JP;
Kazuhiro Aiura, Koshi, JP;
Norihiro Itoh, Koshi, JP;
Naoki Shindo, Koshi, JP;
Yuki Ito, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.