Koshi, Japan

Norihiro Itoh


Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Kumamoto, JP (2013 - 2014)
  • Koshi, JP (2012 - 2023)

Company Filing History:


Years Active: 2012-2025

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13 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Norihiro Itoh

Introduction: Norihiro Itoh, an accomplished inventor based in Koshi, Japan, has made significant contributions to the field of substrate cleaning technologies. With a remarkable portfolio of 13 patents, he has demonstrated innovative thinking and technical expertise, particularly in the development of apparatus and methods that enhance cleaning processes.

Latest Patents: Norihiro Itoh's latest achievements include several patents focused on substrate cleaning. Noteworthy patents include a substrate cleaning apparatus, substrate cleaning method, and a non-transitory computer-readable recording medium. The substrate cleaning apparatus features a support part designed to hold a substrate by contacting its rear surface. It includes an annular member encircling the substrate with an inclined surface relative to the horizontal plane, promoting effective cleaning. The apparatus is equipped with a rotation part for dynamic cleaning motions and two supply parts that deliver cleaning liquid to both the substrate's rear surface and the inclined surface, enhancing cleaning efficiency.

Career Highlights: Itoh’s career at Tokyo Electron Limited has been marked by a commitment to innovation and excellence. His contributions to the company and the field have been significant, focusing on creating solutions that improve manufacturing processes in the semiconductor industry, particularly in cleaning substrates that are crucial for the functionality of various electronic devices.

Collaborations: Throughout his career, Norihiro Itoh has collaborated with notable professionals such as Kazuhiro Aiura and Jiro Higashijima. These partnerships have fostered an environment of creativity and collaboration, enabling the development of cutting-edge technologies and processes within the realm of substrate cleaning.

Conclusion: Norihiro Itoh stands out as an innovator in the technology sector, particularly in substrate cleaning apparatuses and methods. His dedication to advancing cleaning technologies is evident in his extensive patent portfolio. As he continues to push the boundaries of innovation at Tokyo Electron Limited, Itoh's work will undoubtedly leave a lasting impact on the industry and inspire future inventors.

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