Koshi, Japan

Jiro Higashijima

USPTO Granted Patents = 39 

Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 63(Granted Patents)


Location History:

  • Koshi, JP (2011 - 2023)
  • Kumamoto, JP (2013 - 2023)

Company Filing History:


Years Active: 2011-2024

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39 patents (USPTO):Explore Patents

Title: Jiro Higashijima: Innovator in Substrate Processing Technology

Introduction

Jiro Higashijima, an esteemed inventor based in Koshi, Japan, has made significant contributions to the field of substrate processing technology. With an impressive portfolio of 39 patents, his innovations have had a profound impact on the industry, particularly in enhancing semiconductor manufacturing processes.

Latest Patents

Among his latest inventions are two noteworthy patents related to substrate processing apparatuses. The first is a "Substrate Processing Apparatus and Cleaning Method of Mist Guard," which features a complex assembly including a holder for substrates, a driving unit for rotation, and a mist guard designed for optimal cleaning. This innovative design allows for effective application and dispersion of processing and cleaning liquids, ensuring high-quality substrate treatment.

The second patent, titled "Substrate Processing Apparatus and Manufacturing Method Therefor," focuses on a nozzle unit composed of multiple layers and a corrosion-resistant resin nozzle tip. This design enhances the durability and functionality of the nozzle, which is essential for precise application of processing materials in semiconductor manufacturing.

Career Highlights

Jiro Higashijima currently works at Tokyo Electron Limited, a leading manufacturer in the semiconductor equipment industry. His role has enabled him to spearhead innovative projects that have garnered attention for their effectiveness and technological advancement. With 39 patents under his name, Higashijima stands out as a key figure in the realm of substrate processing.

Collaborations

Throughout his career, Higashijima has collaborated with notable coworkers including Nobuhiro Ogata and Norihiro Ito. These partnerships have fostered a creative environment that nurtures innovative ideas and solutions, further expanding the capabilities of substrate processing technologies.

Conclusion

Jiro Higashijima's dedication to advancing substrate processing technology through his numerous patents underscores the vital role inventors play in driving innovation. His work not only enhances manufacturing processes but also sets a standard for future developments in the semiconductor industry. As technology continues to evolve, Higashijima's contributions will undoubtedly leave a lasting legacy.

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