The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2021
Filed:
Dec. 11, 2019
Tokyo Electron Limited, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatus includes a processing liquid supply mechanismconfigured to supply a SPM liquid to a substrate; a temperature adjusting unit (heater)configured to adjust a temperature of the SPM liquid at a time when the SPM liquid is supplied to the substrate from the processing liquid supply mechanism; an acquisition unit (temperature sensor)configured to acquire temperature information of the SPM liquid on a surface of the substrate; and a control unitconfigured to set an adjustment amount of the temperature adjusting unit (heater)based on the temperature information of the SPM liquid acquired by the acquisition unit (temperature sensor). The temperature adjusting unit (heater)adjusts, based on the adjustment amount set by the control unit, the temperature of the SPM liquid at the time when the SPM liquid is supplied to the substrate.