The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Dec. 22, 2011
Applicants:

Shigeru Kasai, Nirasaki, JP;

Ayuta Suzuki, Nirasaki, JP;

Ikuo Sawada, Nirasaki, JP;

Naoki Shindo, Koshi, JP;

Masatake Yoneda, Nirasaki, JP;

Kazuhiro Ooya, Nirasaki, JP;

Inventors:

Shigeru Kasai, Nirasaki, JP;

Ayuta Suzuki, Nirasaki, JP;

Ikuo Sawada, Nirasaki, JP;

Naoki Shindo, Koshi, JP;

Masatake Yoneda, Nirasaki, JP;

Kazuhiro Ooya, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/02052 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/02057 (2013.01);
Abstract

Disclosed is a liquid processing apparatus that processes a substrate with a processing liquid. The processing apparatus includes: a substrate holder configured to hold the substrate; a processing liquid supply unit configured to supply the processing liquid to the substrate held by the substrate holder; a rinsing liquid supply unit configured to supply a rinsing liquid to the substrate; and a light emitting element configured to emit light of a wavelength range, which is absorbed only by the substrate, and irradiate the emitted light to the substrate.


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