The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2013

Filed:

Aug. 22, 2012
Applicants:

Teruomi Minami, Koshi, JP;

Norihiro Ito, Koshi, JP;

Yuji Kamikawa, Koshi, JP;

Inventors:

Teruomi Minami, Koshi, JP;

Norihiro Ito, Koshi, JP;

Yuji Kamikawa, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A liquid processing apparatuscomprises a casing, a substrate holding mechanismthat holds a wafer (substrate to be processed) W, a process-liquid supplying mechanismthat supplies a process liquid, a draining cupthat receives a process liquid, and a draining pipethat discharges a process liquid outside. The process-liquid supplying mechanismincludes a first chemical-liquid supply mechanism that supplies a hydrofluoric process liquid, and a drying-liquid supplying mechanism that supplies an organic solvent for drying a wafer W. A control partcauses the first chemical-liquid supplying mechanism to supply a hydrofluoric process liquid, and then causes the drying-liquid supplying mechanism to supply an organic solvent. In addition, before the control partcauses the drying-liquid supplying mechanism to supply an organic solvent, the control part causes a cleaning mechanismto remove an alkaline component in a casing


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