The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Nov. 22, 2011
Takayuki Toshima, Koshi, JP;
Mitsuaki Iwashita, Nirasaki, JP;
Yuji Kamikawa, Koshi, JP;
Mikio Nakashima, Koshi, JP;
Takayuki Toshima, Koshi, JP;
Mitsuaki Iwashita, Nirasaki, JP;
Yuji Kamikawa, Koshi, JP;
Mikio Nakashima, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed is a substrate processing apparatus including a processing vessel in which a target substrate W is processed by using a high-pressure fluid in a supercritical state or a subcritical state, and pipes that are divided into a first pipe member and a second pipe member in a flowing direction of the fluid and circulate the fluid are connected to processing vessel. A connecting/disconnecting mechanism moves at least one of first and second pipe members between a connection position and a separation position of first pipe member and the second pipe member, and opening/closing valves are installed in each of first and second pipe members and are closed at the time of separating pipe members.