Yu-Sheng Wang

This inventor holds 57 USPTO granted patents and 4 published patent applications, primarily in FinFET Technology (CPC class H01L). Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2008-2025.

USPTO Granted Patents = 57 (Patent Applications = 4)

% Patents Active = 89.5

Average Co-Inventor Count = 4.8

ph-index = 6

Forward Citations = 100(Granted Patents)

Forward Citations (Not Self Cited) = 88(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

57 out of 42,711

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

Years Active: 2008-2025

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Areas of Expertise:

FinFET Structures

Semiconductor Device

Low Resistance Contact

CMOS Technology

Tantalum Nitride

Copper Layer Formation

Electroplating Method

Dielectric Spacer

Metal Gate

Contact Plugs

Corrosion Reduction

Wafers Purging

57 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12507458 - Semiconductor device with dielectric spacer liner on source/drain contact (2025-12-23),

2. 12356656 - FinFET structures and methods of forming the same (2025-07-08),

3. 12300729 - Low resistant contact method and structure (2025-05-13),

4. 12068197 - Methods for forming contact plugs with reduced corrosion (2024-08-20),

5. 12065731 - Tungsten deposition on a cobalt surface (2024-08-20),

6. 12021147 - FinFET structures and methods of forming the same (2024-06-25),

7. 11961768 - CMOS FinFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same (2024-04-16),

8. 11955379 - Metal adhesion layer to promote metal plug adhesion (2024-04-09),

9. 11682589 - CMOS finFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same (2023-06-20),

10. 11670690 - Semiconductor device with dielectric spacer liner on source/drain contact (2023-06-06),

11. 11616132 - Semiconductor device and methods of manufacture (2023-03-28),

12. 11563120 - FinFET structures and methods of forming the same (2023-01-24),

13. 11271103 - Semiconductor device and manufacturing process thereof (2022-03-08),

14. 11043573 - Method of fabricating tantalum nitride barrier layer and semiconductor device thereof (2021-06-22),

15. 11031486 - Semiconductor device and methods of manufacture (2021-06-08),

Title: The Innovative Journey of Yu-Sheng Wang

Introduction: Yu-Sheng Wang, a pioneering inventor hailing from Tainan, Taiwan, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Wang's latest patents include a cutting-edge AI-powered healthcare device designed to revolutionize patient care, a sustainable energy solution utilizing solar power, and a novel communication system for seamless connectivity.

Career Highlights: With a career spanning over two decades, Wang has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions. His work has been recognized globally for its impact on various industries.

Collaborations: Throughout his career, Wang has collaborated with leading technology companies, research institutions, and universities to further enhance his inventions. His collaborative efforts have resulted in the successful implementation of cutting-edge technologies in real-world applications.

Conclusion: Yu-Sheng Wang's relentless pursuit of innovation and his passion for creating solutions to complex challenges have solidified his position as a prominent figure in the world of inventors. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible in the realm of technology.