Yamanashi, Japan

Yasushi Mizusawa

This inventor holds 22 USPTO granted patents and 4 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Tokyo Electron Limited. Active years: 2010-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasushi Mizusawa. Retrieved from https://idiyas.com/inventor/yasushi-mizusawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 72.7

Average Co-Inventor Count = 4.6

ph-index = 6

Forward Citations = 123(Granted Patents)


Location History:

  • Albany, NY (US) (2010 - 2012)
  • Tokyo, JP (2015)
  • Yamanashi, JP (2010 - 2018)
  • Nirasaki, JP (2012 - 2018)

Company Filing History:


Years Active: 2010-2018

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Areas of Expertise:
Film Forming Method
Semiconductor Device
Copper Wiring
Deposition System
Reactive Metal
Plasma Sputtering
Integrated Circuits
Particle Contamination
Vacuum Processing
Metal Film
Raw Material Recovery
Trapping Mechanism
22 patents (USPTO):Explore Patents

Title: Innovations of Yasushi Mizusawa: Pioneering Thin Film Technologies

Introduction

Yasushi Mizusawa, an accomplished inventor based in Yamanashi, Japan, has made significant contributions to the field of material science, particularly in thin film technology. With an impressive portfolio of 22 patents, he has been at the forefront of innovations that enhance the efficiency and quality of film formation processes.

Latest Patents

Mizusawa's recent patents showcase his expertise in developing sophisticated techniques for forming thin films. One notable invention is a film forming method that utilizes a reversible decomposition reaction. This method involves feeding a raw material gas to a substrate in a processing container, allowing for controlled thermal decomposition. A decomposition restraint gas is simultaneously introduced to prevent unwanted film formation at the peripheral areas of the substrate, thus ensuring precise control over the film's deposition.

Another significant patent is the trap assembly in a film forming apparatus, designed to effectively capture exhaust gas from the process chamber. This assembly consists of a housing that accommodates multiple trap units arranged along the exhaust gas flow direction. Each unit contains trap panels that are carefully structured to maximize efficiency in trapping exhaust gases while minimizing disruption to the flow.

Career Highlights

Mizusawa is currently affiliated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has not only contributed to technical advancements but has also positioned him as a key player in enhancing the productivity of film formation technologies.

Collaborations

Throughout his career, Mizusawa has collaborated with talented professionals, including colleagues Tatsuo Hatano and Masamichi Hara. Their combined expertise has led to groundbreaking innovations that continue to inspire advancements in thin film production and semiconductor technologies.

Conclusion

Yasushi Mizusawa’s innovative patents and collaborative efforts reflect his commitment to advancing thin film technology. His contributions play a vital role in shaping the future of material science, with the potential for applications that extend beyond the semiconductor industry. As he continues to innovate, the impact of his work will undoubtedly resonate within the field for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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