The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Feb. 19, 2008
Atsushi Gomi, Nirasaki, JP;
Yasushi Mizusawa, Albany, NY (US);
Tatsuo Hatano, Nirasaki, JP;
Masamichi Hara, Nirasaki, JP;
Osamu Yokoyama, Nirasaki, JP;
Satoshi Taga, Nirasaki, JP;
Atsushi Gomi, Nirasaki, JP;
Yasushi Mizusawa, Albany, NY (US);
Tatsuo Hatano, Nirasaki, JP;
Masamichi Hara, Nirasaki, JP;
Osamu Yokoyama, Nirasaki, JP;
Satoshi Taga, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A film formation method is disclosed for depositing a metal film on a target substrate by supplying a metal carbonyl source in gas phase to a surface of the target substrate and decomposing the source near the surface of the target substrate. The method includes a step of preferentially decomposing the metal carbonyl source in an area near the outer peripheral portion of the target substrate when the metal film is being deposited on the surface of the target substrate. As a result, a CO concentration in the atmosphere is increased locally near the outer peripheral portion of the target substrate and the depositing of the metal film on the outer peripheral portion is better controlled.