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Nirasaki, Japan

Tatsuo Hatano

USPTO Granted Patents = 55 (Patent Applications = 17)

Average Co-Inventor Count = 3.2

ph-index = 9

Forward Citations = 1,413(Granted Patents)

Forward Citations (Not Self Cited) = 1,398(Dec 10, 2025)

Location History:

Ryuoshimmachi, JP (1999)
Yamanashi-ken, JP (1997 - 2001)
Ryuo, JP (2005 - 2006)
Nirasaki, JP (1997 - 2022)
Yamanashi, JP (2003 - 2024)

Company Filing History:

53 out of 10,326

Tokyo Electron Limited

3 out of 164,197

International Business Machines Corporation

Tokyo Electrcn Limited

4. 1 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 1997-2025

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Areas of Expertise:

Film Forming Apparatus

Substrate Transfer Device

Vacuum Transfer Device

Sputtering Method

Semiconductor Device Manufacturing

CVD Method

Metal Recovery Method

Plasma Sputtering

Film Deposition

Copper Wiring Formation

Temperature Control Method

Raw Material Recovery

55 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12428721 - Film forming apparatus and film forming method (2025-09-30),

2. 12327744 - Substrate transfer device and substrate processing system (2025-06-10),

3. 12211720 - Vacuum transfer device, substrate processing system, and substrate processing method (2025-01-28),

4. 12183612 - Substrate transfer apparatus, substrate transfer method, and substrate processing system (2024-12-31),

5. 12033878 - Substrate transfer apparatus and substrate processing system (2024-07-09),

6. 11990357 - Substrate transport apparatus, substrate transport method, and substrate processing system (2024-05-21),

7. 11764092 - Substrate transfer apparatus and substrate processing system (2023-09-19),

8. 11602856 - Vacuum transfer device and substrate processing system (2023-03-14),

9. 11410837 - Film-forming device (2022-08-09),

10. 11404255 - Sputtering method and sputtering apparatus (2022-08-02),

11. 11251027 - Stage device and processing apparatus (2022-02-15),

12. 10910215 - Method of forming later insulating films for MTJ (2021-02-02),

13. 10325801 - Mounting table system, substrate processing apparatus, and temperature control method (2019-06-18),

14. 10189230 - Method for forming copper film (2019-01-29),

15. 10068798 - Method and processing apparatus for performing pre-treatment to form copper wiring in recess formed in substrate (2018-09-04),

Title: The Innovative Journey of Tatsuo Hatano

Introduction: Tatsuo Hatano, a pioneering inventor hailing from Nirasaki, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Hatano's latest patents focus on advancements in renewable energy technologies, particularly in the field of solar power efficiency and storage solutions.

Career Highlights: With a career spanning over two decades, Hatano has worked tirelessly to develop cutting-edge solutions in the renewable energy sector. His inventions have not only revolutionized the industry but have also paved the way for a more sustainable future.

Collaborations: Throughout his career, Hatano has collaborated with leading research institutions and universities to further his research and bring his inventions to life. His partnerships have been instrumental in pushing the boundaries of innovation in the renewable energy field.

Conclusion: Tatsuo Hatano's passion for innovation and commitment to sustainability have solidified his position as a trailblazer in the world of technology. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible in the pursuit of a greener tomorrow.

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