The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Jan. 23, 2009
Masamichi Hara, Nirasaki, JP;
Yasushi Mizusawa, Nirasaki, JP;
Satoshi Taga, Nirasaki, JP;
Atsushi Gomi, Nirasaki, JP;
Tatsuo Hatano, Nirasaki, JP;
Masamichi Hara, Nirasaki, JP;
Yasushi Mizusawa, Nirasaki, JP;
Satoshi Taga, Nirasaki, JP;
Atsushi Gomi, Nirasaki, JP;
Tatsuo Hatano, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed is a method for film formation, comprising allowing a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas to flow into a region on the upper outside of the outer periphery of a substrate to be treated in a diameter direction of the substrate while avoiding the surface of the substrate and diffusing the metal carbonyl from the treatment gas stream into the surface of the substrate to form a metal film on the surface of the substrate.