The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Sep. 19, 2014
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); H01J 37/32 (2006.01); C23C 16/16 (2006.01); B01D 8/00 (2006.01); F15D 1/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/16 (2013.01); C23C 16/455 (2013.01); C23C 16/458 (2013.01); C23C 16/46 (2013.01); C23C 16/463 (2013.01); H01J 37/32834 (2013.01); H01J 37/32844 (2013.01); B01D 8/00 (2013.01); B01D 2258/0216 (2013.01); F15D 1/0005 (2013.01); Y02C 20/30 (2013.01); Y02P 70/605 (2015.11);
Abstract
A trap mechanism for trapping exhaust gas from a process chamber. The trap assembly includes a housing containing a plurality of trap units. The plurality of trap units are arranged successively along a flow direction of said exhaust gas. Each trap unit includes a set of trap panels parallel to each other and spaced apart from each other. The two opposite surfaces with a larger area of each trap panel are oriented substantially parallel to a flow direction of the exhaust gas flow. The two opposite surfaces with a smaller area of each trap panels are oriented orthogonal to the exhaust gas flow.