Kaoru Yamamoto

This inventor holds 13 USPTO granted patents, primarily in Plasma Deposition Technology. Top assignee: Tokyo Electron Limited. Active years: 2008-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kaoru Yamamoto. Retrieved from https://idiyas.com/inventor/kaoru-yamamoto-qwgp6xsc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 13

% Patents Active = 69.2

Average Co-Inventor Count = 3.8

ph-index = 7

Forward Citations = 369(Granted Patents)

Location History:

Delmar, NY (US) (2008 - 2012)
Nirasaki, JP (2010 - 2018)
Yamanashi, JP (2015 - 2018)

Company Filing History:

13 out of 10,947

Tokyo Electron Limited

patents

Years Active: 2008-2018

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Areas of Expertise:

Film Forming

Reversible Decomposition

Electrostatic Attraction

Cooling Treatment

Deposition Device

Substrate Mounting

Gate Valve Unit

Raw Material Recovery

Plasma Processing

Atomic Layer Deposition

Substrate Supporting Structure

13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9976217 - Film forming method using reversible decomposition reaction (2018-05-22),

2. 9896761 - Trap assembly in film forming apparatus (2018-02-20),

3. 9787222 - Electrostatic attraction apparatus, electrostatic chuck and cooling treatment apparatus (2017-10-10),

4. 9673078 - Cooling processing apparatus and method for operating the same (2017-06-06),

5. 9404180 - Deposition device (2016-08-02),

6. 9202728 - Substrate mounting mechanism, and substrate processing apparatus (2015-12-01),

7. 9121515 - Gate valve unit, substrate processing device and substrate processing method thereof (2015-09-01),

8. 8992686 - Mounting table structure, film forming apparatus and raw material recovery method (2015-03-31),

9. 8408025 - Raw material recovery method and trapping mechanism for recovering raw material (2013-04-02),

10. 8163087 - Plasma enhanced atomic layer deposition system and method (2012-04-24),

11. 7837828 - Substrate supporting structure for semiconductor processing, and plasma processing device (2010-11-23),

12. 7651568 - Plasma enhanced atomic layer deposition system (2010-01-26),

13. 7314835 - Plasma enhanced atomic layer deposition system and method (2008-01-01),

Title: Kaoru Yamamoto: Innovator in Film Forming Technology

Introduction

Kaoru Yamamoto is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of film forming technology, holding a total of 13 patents. His innovative approaches have advanced the methods used in various industrial applications.

Latest Patents

Yamamoto's latest patents include a film forming method using a reversible decomposition reaction. This method involves feeding a raw material gas that causes a reversible decomposition reaction toward the upper surface of a substrate placed on a table in a processing container. The process decomposes the raw material gas with a predetermined scheme, forming a thin film on the substrate's surface. Additionally, he has developed a trap assembly in a film forming apparatus, which is designed to trap exhaust gas from a process chamber. This assembly includes a housing with multiple trap units arranged along the exhaust gas flow direction, enhancing the efficiency of the gas trapping process.

Career Highlights

Kaoru Yamamoto is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has been instrumental in developing advanced technologies that improve production processes and product quality.

Collaborations

Yamamoto has collaborated with notable colleagues, including Masamichi Hara and Atsushi Gomi. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Kaoru Yamamoto's contributions to film forming technology and his innovative patents have established him as a key figure in his field. His work continues to influence advancements in industrial applications, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]